Chemical Vapor Deposition (CVD)

Name: Chemical Vapor Deposition (CVD)
Brand: Nova Science Publishers, Inc
Price: 106.49 GBP
Availability: OutOfStock

Methods and Technologies

Written by Levi Karlsson

£106.49 £141.99

Out of stock

Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate.